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A before and after picture showing the same region of a PS-PMMA block copolymer. The ?Before? image shows a series of concentric scratches made with nanolithography. The ?After? image shows the polymer fully healed after elevating the sample temperature to 125°C. 2 µm scan.
Date: 16th November 17
Last Updated: February 15, 2021, 6:31 pm
Author: Asylum Research
Category: Asylum Gallery Image