Particle and Defect Characterization Solutions for Semiconductor Applications Provided by High-Speed, High-Resolution Atomic Force Microscopy (AFM)

Semiconductor fabrication requires extreme levels of cleanliness, as any contamination may result in device failure. For this reason, great care is taken to identify contamination and defects, and eliminate their sources. Quick and accurate identification of these sources, coupled with feedback into the manufacturing process, can help ensure a stable supply of products and increase profitability through yield improvement.

Download the application note to learn:

• Why AFM's are essential tools for semiconductor defect inspection
• How Jupiter XR AFM can characterize nanoscale contamination quickly and accurately
• How Jupiter XR AFM and Ergo software simplify defect inspection

(Free download, compliments of Asylum Research, the Technology Leader in Atomic Force Microscopy)