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Piezoresponse force microscopy (PFM) is an atomic force microscopy technique used to characterize electromechanical coupling in piezoelectric and ferroelectric materials. It characterizes the converse piezoelectric effect by applying an electrical bias locally to the sample through the AFM tip while simultaneously detecting the mechanical response. It measures both the piezoelectric coefficient (typically in the range of ~1 - 500 pm/V) and the polarization direction of the response.
Asylum Research is widely recognized as the global leader in commercial PFM technology. Over the years, we have been at the forefront of providing crosstalk-free, highly sensitive PFM measurements using advanced and proprietary measurement techniques. Our latest breakthrough in this field is the development of the Vero Interferometric AFM, which is based on interferometric cantilever displacement detection. This revolutionary AFM enables users to measure the d33 constant, a critical metric in ferroelectric materials characterization, with reproducible and artifact-free results.
The Vero AFMs represent the next generation of AFMs, offering precise and accurate measurement of true tip displacement through Quadrature Phase Differential Interferometry (QPDI). Building upon the exceptional stability and performance of the Cypher AFM family, our patented QPDI innovation allows Vero AFMs to deliver results with higher accuracy, precision, and repeatability. To learn more about how interferometric cantilever displacement detection and the new Vero AFM can improve PFM measurements, please access the resources below.
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"Ferroelectric-field-effect-enhanced electroresistance in metal/ferroelectric/semiconductor tunnel junctions," Z. Wen, C. Li, D. Wu, A. Li, and N. Ming, Nat. Mater. 12, 617 (2013). https://doi.org/10.1038/nmat3649
"Ferroelectric order in individual nanometre-scale crystals," M. J. Polking, M.-G. Han, A. Yourdkhani, V. Petkov, C. F. Kisielowski, V. V. Volkov, Y. Zhu, G. Caruntu, A. P. Alivisatos, and R. Ramesh, Nat. Mater. 11, 700 (2012). https://doi.org/10.1038/nmat3371
"Tunnel electroresistance in junctions with ultrathin ferroelectric Pb(Zr0.2Ti0.8)O3 barriers," D. Pantel, H. Lu, S. Goetze, P. Werner, D. J. Kim, A. Gruverman, D. Hesse, and M. Alexe, Appl. Phys. Lett. 100, 232902 (2012). https://doi.org/10.1063/1.4726120
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