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AFM for 2D Materials Research

AFM for 2D Materials Research​

Accelerate your 2D materials discovery and get to your science faster and with ease with our high-performance AFMs. From routinely imaging defects, lattices, and the moiré patterns of twisted van der Waals heterostructures, to precision nanolithography and nanomanipulation, to environmental control, our AFMs offer a complete solution for all your 2D materials characterization needs. ​

Take your research to the next level and explore novel electronic and quantum phenomena at the frontiers of materials physics with our award-winning, next-generation AFMs.​

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Moiré Imaging

High resolution, one of the hallmarks of our high-performance AFMs, is essential for characterizing twisted van der Waals heterostructures for twistronics, where even fractional changes in the interlayer twist angle can drastically alter material properties. This twist angle can be calculated from the moiré periodicity of the twisted 2D material device. While many AFMs can image this moiré pattern, our AFMs can do this routinely, and quickly - get to your science that much faster and see the difference for yourself.


Torsional Force Microscopy

Torsional Force Microscopy (TFM) is one of several modes that can be used to image the moiré pattern of twisted of 2D materials.

  • Standard on all our AFM platforms. No additional hardware or software needed.
  • TFM with our high-performance AFMs & makes imaging the moiré pattern of twisted 2D materials routine and easy.
  • Atomic lattice and various defects can also be imaged.
  • Optional blueDrive photothermal excitation gives cleanest response.
  • Resonance tracking with DART can help  stabilize variations and reduce signal drift.


The Need for Speed

Our next-generation AFMs are designed for high resolution and fast scanning. Compared to conventional AFMs, scanning more than 10x faster enables you to find your region of interest that much sooner.

  • Speed is productivity. Find the region with the moiré pattern corresponding to your desired twist angle quickly and get on to your science.
  • Minimize the effects of thermal drift with faster scanning. Thermal drift directly affects the moiré periodicity accuracy.


Closed Loop Scanning

Closed loop scan control is essential for moiré imaging. Not only does this allow the cantilever tip to be positioned with atomic scale precision, but this also prevents the scan distortion that occurs with open loop scanners.

  • Use a larger survey scan to define and map out subsequent scans.
  • Zoom in to specific locations with high accuracy and precision. And do so without any scan distortion.
  • Accurately measure the moiré periodicity without open loop scan distortion.


Routine and Easy

Leading twistronics groups worldwide choose our high-performance AFMs because of how routine it is to image the moiré pattern of twisted 2D materials. Our AFMs' high resolution, fast scanning, and low-noise electronics transform this into an easy task.

  • Moiré pattern can often be resolved starting from the very first scan.
  • Spend less time searching your sample and more time with your science.

Megapixel Survey Scanning

Survey a relatively large area while still preserving the moiré pattern by imaging with megapixel resolution. In this way, you can cover more ground in search of the desired moiré periodicity. This is made possible with our low noise, high speed next-generation AFMs.

  • Fast scanning coupled with low noise results in good signal contrast even at high speeds.
  • Digitally zoom in to your data to explore the moiré periodicity in at different locations within the larger survey scan area.

Tip-Based NanoFabrication

Our AFMs set the industry standard for tip-based nanofabrication of 2D materials, delivering the ultimate in precision, reliability, and noise stability required for nanolithography and nanomanipulation. With unmatched force control and precision closed loop positioning, the cantilever tip can reliably cut, slide, and contact clean a variety of 2D materials.


Graphene Cutting

Anodic oxidation lithography enables precise, resist-free nanoscale patterning and cutting of diverse 2D materials like graphene, hBN, and transition metal dichalcogenides. In this mode a biased cantilever tip traces a prescribed pattern that can be imported or drawn manually. All relevant parameters, such as force, speed, frequency, amplitude, and DC bias can be controlled.

  • Standard feature built into all our AFM platforms.
  • Cut-widths as narrow as 15 nm, enabled by our high precision scanners.
  • Isolate functional device regions electrically.
  • Cut larger flakes cleanly and precisely, to build twisted heterostructures with the “cut-and-stack” method.
  • Fabricate novel nanostructures such as quantum point contacts, quantum dots, and nanoribbons.

NanoManipulation

The same high-precision force control and closed loop positioning used for AFM imaging enables precise sample manipulation at the nanoscale. Use the cantilever tip to rotate, push, pull, and fold 2D layers, as well as sweep contaminants out of the region of interest.

  • Standard feature built into all our AFM platforms.
  • Explore twist-angle dependent properties in 2D materials.
  • Sweep away contamination and debris and thereby clean the surfaces.
  • Squeeze out contamination between layers and improve interlayer adhesion

A MoS₂ flake being rotated on graphene by the AFM tip. Courtesy of M. Liao, Sichuan University.

Functional Characterization

Go beyond topography with AFM to explore the functional response of your 2D materials. Our comprehensive suite of characterization modes lets you map localized electrical and mechanical properties at the nanoscale.


Electrical Characterization

Explore nanoscale electrical phenomena of your 2D materials with techniques like conductive AFM (cAFM), kelvin probe force microscopy (KPFM), and scanning capacitance microscopy (SCM). These techniques are critical for mapping local variations in electrical properties, as well as delivering multimodal imaging contrast beyond the limits of basic topography.

  • Distinguish ABA from ABC graphene with the potential signal from KPFM or the capacitance signal from SCM.
  • Resolve and characterize atomic scale defects with conductive AFM.
  • Use a secondary channel from modes like cAFM, KPFM, and PFM for moiré imaging.
  • Study twist-dependent electrical transport.

Defects in monolayer WS₂ taken with cAFM. Courtesy of the Velasco and Yan groups, UC Santa Cruz


Mechanical Characterization

Advance your 2D materials characterization with our suite of AFM-based nanomechanical modes. These techniques provide quantitative mapping of properties like elastic modulus, viscoelastic properties, adhesion, friction, and mechanical fatigue.

  • Measure elastic modulus and fracture toughness with AFM based nanoindentation.
  • Use the cantilever tip to induced localized strain gradient to modulate properties.
  • Use a secondary channel like contact resonance amplitude as a high contrast signal for moiré imaging.

AFM-based fatigue testing of graphene and graphene oxide. Courtesy of T. Cui et al, U of Toronto.

Environmental Control

When ambient conditions are not sufficient for your 2D materials research, take control of the sample's environment with our array of options and accessories. Whether you want to prevent sample oxidation with an inert gas environment, track humidity for consistent graphene cutting, or sweep the sample's temperature with high-precision heating and cooling, discover our modular options built to cover your toughest 2D materials research needs.


Glovebox AFM

Typical AFMs struggle with the high vibration and noise levels inside a glovebox. Our high-performance AFMs thrive, routinely resolving the moiré pattern of twisted van der Waals heterostructures, and even achieving atomic resolution without requiring any vibration isolation.

  • Image samples that are susceptible to oxygen and humidity, such as many transition metal dichalcogenides.
  • Routinely image with high resolution – atomic point defects, lattice, and moiré patterns.

Environmental Cells

Take control of the environment around your sample with our wide range of environmental accessories.

  • Image your sample in a controlled environment such as an inert gas or humid air, with our fully sealed cells.
  • Transfer your air-sensitive sample from a glovebox to the AFM with our sealed cell.
  • Heat and cool the sample with integrated environmental control.
  • Subject your sample to in-plane and out-of-plane magnetic fields on our Jupiter and MFP 3D Origin platforms.

2D Atomic Defect Webinar Series

This tutorial series focuses on the use of atomic force microscopy (AFM) for routine detection and characterization of atomic-scale defects in 2D materials. Traditional approaches, such as scanning tunneling microscopy and scanning transmission electron microscopy, offer exceptional spatial resolution, but can pose challenges in accessibility and practicality for routine measurements, especially those required for process control.

Register today to secure your place

Nov
12
CAFM of atomic defects in TMDs
Dec
10
LFM of atomic defects in 2D materials
Jan
20
CAFM imaging and electronic spectroscopy of atomic defects in 2D materials
Feb
11
Autonomous defects detection & back-contact free CAFM
Feb
25
Higher eigenmode imaging of defects
Mar
11
Title to be determined
Mar
25
Understanding the physical mechanism behind atomic resolution imaging in conductive atomic force microscopy in air
Apr
8
CAFM of defects in hBN

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