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Contact Resonance image of titanium thin film patterned on silicon

Reference sample patterned with 200 nm high titanium features on a silicon substrate imaged with DART Contact Resonance mode. Image shows topography with an overlay of modulus (Si ~ 165 GPa, Ti ~ 110-125 GPa). Contact Resonance imaging was performed using BueDrive? photothermal cantilever excitation on a Cypher S AFM, 25 ?m scan. Sample courtesy of Donna Hurley, National Institute of Standards and Technology (NIST).

Category: Asylum Gallery Image

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