Part of the Oxford Instruments Group

Single Step of Molybdenum Disulfide

Single layer of MoS2 deposited on a silicon substrate with a step height of 7.5 Å. Imaged with the Cypher AFM. Image courtesy of Andras Kis, Electrical Engineering Institute, Ecole Polytechnique Federale de Lausanne.

Date: 16th November 17

Last Updated: July 12, 2018, 11:13 am

Author: Asylum Research

Category: Asylum Gallery Image