Single layer of MoS2 deposited on a silicon substrate with a step height of 7.5 Å. Imaged with the Cypher AFM. Image courtesy of Andras Kis, Electrical Engineering Institute, Ecole Polytechnique Federale de Lausanne.
Date: 16th November 17
Last Updated: July 12, 2018, 11:13 am
Author: Asylum Research
Category: Asylum Gallery Image