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Stressed Silicon Nitride Membrane with Nickel Nanoparticles

Strontium titanium oxide surface, etched to remove the surface strontium, and partially annealed to allow the titanium to redistribute. The step edges are 4 Å tall. 2 µm scan. Imaged with a MFP-3D AFM. Courtesy of S. MacLaren and K. Roos, University of Illinois at Urbana-Champaign.

Date: 16th November 17

Author: Asylum Research

Category: Asylum Gallery Image

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