Part of the Oxford Instruments Group

Stressed Silicon Nitride Membrane with Nickel Nanoparticles

Strontium titanium oxide surface, etched to remove the surface strontium, and partially annealed to allow the titanium to redistribute. The step edges are 4 Å tall. 2 µm scan. Imaged with a MFP-3D AFM. Courtesy of S. MacLaren and K. Roos, University of Illinois at Urbana-Champaign.

Date: 16th November 17

Last Updated: July 12, 2018, 11:13 am

Author: Asylum Research

Category: Asylum Gallery Image