Best Practices for Critical Dimension Measurements using AFM: Probe Selection and Data Analysis

Description

Silicon photonics is the study and use of silicon as the optical medium to construct photonic systems such as lasers, detectors, optical communications systems, and more. Specifically, silicon and SiO2 patterns such as gratings, lines, and sawtooth facets are fabricated on silicon to manipulate light. Accurate characterization of these patterns is important for process development and device optimization. Atomic Force Microscopy (AFM) is a non-destructive, probe-based technique that scans a sharp tip over a surface of interest to generate images of a surface. AFM provides three-dimensional spatial resolution with little or no sample preparation, making it an indispensable tool for characterizing nano- and micro-scale surface structure. This webinar focuses on AFM probe selection and data analysis for a range of critical surface features encountered in the silicon photonics research field.

About Your Speakers

Marta Kocun has a PhD in Biophysics from University of Goettingen, Germany, where her studies focused on investigating the mechanical properties of membranes using AFM. She has been with Oxford Instruments Asylum Research for over 10 years, working on the development of AFM imaging modes, interacting with customers, and working on the Jupiter XR large sample AFM.

Ben Ohler is Senior Product Line Manager for the Jupiter and Cypher family of AFMs at Asylum Research. He received his Ph.D. in chemical engineering from the University of California Santa Barbara. He has worked as an applications scientist and in product marketing in the AFM industry for the past 23 years and for the last 10 years at Asylum Research.