Measuring the Surface Roughness of Thin Films and Substrates with Atomic Force Microscopy (AFM)

Description

Surface roughness is an important measurement for thin films and substrates in a wide range of applications including semiconductor electronics, data storage, optics and other glass components, as well as thin films and coatings from paper to food packaging. Surface roughness is both a useful metric for monitoring deposition, etch, and polishing steps during processing and also a common quality control measure in finished materials. New materials and processes are resulting in surfaces with ultra-low roughness that are difficult or impossible to characterize with traditional stylus and optical profilometers.

This webinar will introduce Atomic Force Microscopy (AFM) as a powerful measurement tool for the measurement of roughness from the scale of angstroms up to tens or hundreds of nanometers. The latest AFMs from Asylum Research can make these measurements faster, easier, and with greater precision than the previous generation AFMs that are still commonly used. These capabilities will be highlighted with cases studies drawn from materials relevant to both industry and academic research.

Join the webinar to learn more about:

• How AFM compares to other roughness measurement technologies
• The types of roughness parameters that AFM can measure
• Practical considerations for making roughness measurements with AFM
• Steps to making a typical roughness measurement with AFM
• How the latest Asylum AFMs have improved roughness characterization
• Case studies of roughness measurements on several different materials

About Your Speakers

Dr. Jason Li
Applications Group Manager
Oxford Instruments Asylum Research Inc.

Dr. Marta Kocun
Product Manager
Oxford Instruments Asylum Research Inc.